An overview of the Trilinos project MA Heroux, RA Bartlett, VE Howle, RJ Hoekstra, JJ Hu, TG Kolda, ... ACM Transactions on Mathematical Software (TOMS) 31 (3), 397-423, 2005 | 1425 | 2005 |

An overview of the Trilinos project MA Heroux, RA Bartlett, VE Howle, RJ Hoekstra, JJ Hu, TG Kolda, ... ACM Transactions on Mathematical Software (TOMS) 31 (3), 397-423, 2005 | 1425 | 2005 |

Two‐dimensional modeling of high plasma density inductively coupled sources for materials processing PLG Ventzek, RJ Hoekstra, MJ Kushner Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1994 | 450 | 1994 |

Two‐dimensional hybrid model of inductively coupled plasma sources for etching PLG Ventzek, TJ Sommerer, RJ Hoekstra, MJ Kushner Applied physics letters 63 (5), 605-607, 1993 | 214 | 1993 |

Integrated plasma equipment model for polysilicon etch profiles in an inductively coupled plasma reactor with subwafer and superwafer topography RJ Hoekstra, MJ Grapperhaus, MJ Kushner Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 15 (4 …, 1997 | 136 | 1997 |

Microtrenching resulting from specular reflection during chlorine etching of silicon RJ Hoekstra, MJ Kushner, V Sukharev, P Schoenborn Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 1998 | 135 | 1998 |

Predictions of ion energy distributions and radical fluxes in radio frequency biased inductively coupled plasma etching reactors RJ Hoekstra, MJ Kushner Journal of applied physics 79 (5), 2275-2286, 1996 | 96 | 1996 |

Spatial distributions of dust particles in plasmas generated by capacitively coupled radiofrequency discharges SJ Choi, PLG Ventzek, RJ Hoekstra, MJ Kushner Plasma Sources Science and Technology 3 (3), 418, 1994 | 73 | 1994 |

Performance of a parallel algebraic multilevel preconditioner for stabilized finite element semiconductor device modeling PT Lin, JN Shadid, M Sala, RS Tuminaro, GL Hennigan, RJ Hoekstra Journal of Computational Physics 228 (17), 6250-6267, 2009 | 72 | 2009 |

Xyce Parallel Electronic Simulator: users' guide. ER Keiter, T Mei, TV Russo, EL Rankin, RL Schiek, HK Thornquist, ... Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA …, 2012 | 54* | 2012 |

A parallel preconditioning strategy for efficient transistor-level circuit simulation HK Thornquist, ER Keiter, RJ Hoekstra, DM Day, EG Boman Proceedings of the 2009 International Conference on Computer-Aided Design …, 2009 | 54 | 2009 |

The Xyce™ parallel electronic simulator–an overview S Hutchinson, E Keiter, R Hoekstra, H Watts, A Waters, T Russo, ... Parallel Computing: Advances and Current Issues, 165-172, 2002 | 39 | 2002 |

Comparison of two-dimensional and three-dimensional models for profile simulation of poly-Si etching of finite length trenches RJ Hoekstra, MJ Kushner Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 16 (6 …, 1998 | 38 | 1998 |

Large-scale transient sensitivity analysis of a radiation-damaged bipolar junction transistor via automatic differentiation ET Phipps, RA Bartlett, DM Gay, RJ Hoekstra Advances in automatic differentiation, 351-362, 2008 | 36 | 2008 |

Redesigning the WARPED simulation kernel for analysis and application development DE Martin, PA Wilsey, RJ Hoekstra, ER Keiter, SA Hutchinson, TV Russo, ... 36th Annual Simulation Symposium, 2003., 216-223, 2003 | 31 | 2003 |

Parallel transistor-level circuit simulation ER Keiter, HK Thornquist, RJ Hoekstra, TV Russo, RL Schiek, EL Rankin Simulation and Verification of Electronic and Biological Systems, 1-21, 2011 | 30 | 2011 |

Trilinos home page MA Heroux, RA Bartlett, VE Howle, RJ Hoekstra, JJ Hu, TG Kolda, ... Go online to http://software. sandia. gov/trilinos, 2004 | 24 | 2004 |

The effect of subwafer dielectrics on plasma properties in plasma etching reactors RJ Hoekstra, MJ Kushner Journal of applied physics 77 (8), 3668-3673, 1995 | 24 | 1995 |

Plasma Sources Sci. Technol SJ Choi, PLG Ventzek, RJ Hoekstra, MJ Kushner | 24 | 1994 |

Simulation of neutron radiation damage in silicon semiconductor devices GL Hennigan, RJ Hoekstra, JP Castro, DA Fixel, JN Shadid Sandia National Laboratories, Tech. Rep. SAND2007-7157, 2007 | 22 | 2007 |