| Actinometry of O, N and F atoms DV Lopaev, AV Volynets, SM Zyryanov, AI Zotovich, AT Rakhimov Journal of Physics D: Applied Physics 50 (7), 075202, 2017 | 79 | 2017 |
| N2 dissociation and kinetics of N (4S) atoms in nitrogen DC glow discharge AV Volynets, DV Lopaev, TV Rakhimova, AA Chukalovsky, ... Journal of Physics D: Applied Physics 51 (36), 364002, 2018 | 53 | 2018 |
| Multifold study of volume plasma chemistry in Ar/CF4 and Ar/CHF3 CCP discharges OV Proshina, TV Rakhimova, AI Zotovich, DV Lopaev, SM Zyryanov, ... Plasma Sources Science and Technology 26 (7), 075005, 2017 | 44 | 2017 |
| Improved plasma resistance for porous low-k dielectrics by pore stuffing approach L Zhang, JF de Marneffe, MH Heyne, S Naumov, Y Sun, A Zotovich, ... ECS Journal of Solid State Science and Technology 4 (1), N3098, 2014 | 32 | 2014 |
| Experimental and PIC MCC study of electron cooling—re-heating and plasma density decay in low pressure rf ccp argon afterglow OV Proshina, TV Rakhimova, AS Kovalev, AN Vasilieva, AI Zotovich, ... Plasma Sources Science and Technology 29 (1), 015015, 2020 | 19 | 2020 |
| Comparison of vacuum ultra-violet emission of Ar/CF4 and Ar/CF3I capacitively coupled plasmas A Zotovich, O Proshina, Z El Otell, D Lopaev, T Rakhimova, A Rakhimov, ... Plasma Sources Science and Technology 25 (5), 055001, 2016 | 19 | 2016 |
| Vacuum ultra-violet emission of CF4 and CF3I containing plasmas and Their effect on low-k materials Z El Otell, V Šamara, A Zotovich, T Hansen, JF de Marneffe, MR Baklanov Journal of Physics D: Applied Physics 48 (39), 395202, 2015 | 17 | 2015 |
| Silicon dioxide and low-k material sputtering in dual frequency inductive discharge by argon ions with energies from 16 to 200 eV DV Lopaev, TV Rakhimova, AT Rakhimov, AI Zotovich, SM Zyryanov, ... Journal of Physics D: Applied Physics 51 (2), 02LT02, 2017 | 16 | 2017 |
| Damage to porous SiCOH low-k dielectrics by O, N and F atoms at lowered temperatures DV Lopaev, SM Zyryanov, AI Zotovich, TV Rakhimova, YA Mankelevich, ... Journal of Physics D: Applied Physics 53 (17), 175203, 2020 | 12 | 2020 |
| Plasma probe characteristics in low density hydrogen pulsed plasmas DI Astakhov, WJ Goedheer, CJ Lee, VV Ivanov, VM Krivtsun, AI Zotovich, ... Plasma Sources Science and Technology 24 (5), 055018, 2015 | 12 | 2015 |
| Damage and etching of ultra low-k materials in fluorocarbon plasma at lowered temperatures DV Lopaev, YA Mankelevich, TV Rakhimova, AI Zotovich, SM Zyryanov, ... Journal of Physics D: Applied Physics 50 (48), 485202, 2017 | 11 | 2017 |
| ‘Virtual IED sensor’for df rf CCP discharges M Bogdanova, D Lopaev, T Rakhimova, D Voloshin, A Zotovich, ... Plasma Sources Science and Technology 30 (7), 075020, 2021 | 10 | 2021 |
| Low-k protection from F radicals and VUV photons using a multilayer pore grafting approach A Zotovich, A Rezvanov, R Chanson, L Zhang, N Hacker, K Kurchikov, ... Journal of Physics D: Applied Physics 51 (32), 325202, 2018 | 9 | 2018 |
| Synergistic effect of VUV photons and F atoms on damage and etching of porous organosilicate films DV Lopaev, SM Zyryanov, AI Zotovich, TV Rakhimova, YA Mankelevich, ... Plasma Processes and Polymers 15 (4), 1700213, 2018 | 9 | 2018 |
| Experimental and DFT study of nitrogen atoms interactions with SiOCH low-κ films EN Voronina, YA Mankelevich, TV Rakhimova, AP Palov, DV Lopaev, ... The European Physical Journal D 71, 1-8, 2017 | 9 | 2017 |
| Pore sealing mechanism in OSG low‐k films under ion bombardment EN Voronina, AA Sycheva, DV Lopaev, TV Rakhimova, AT Rakhimov, ... Plasma Processes and Polymers 17 (2), 1900165, 2020 | 8 | 2020 |
| Experimental study of transition from electron beam to rf-power-controlled plasma in DFCCP in argon with additional ionization by an electron beam AI Zotovich, DV Lopaev, MA Bogdanova, SM Zyryanov, AT Rakhimov Journal of Physics D: Applied Physics 55 (31), 315201, 2022 | 5 | 2022 |
| Electron energy probability function in plasma controlled by high-energy run-away electrons DV Lopaev, MA Bogdanova, AV Volynets, AI Zotovich, SM Zyryanov Plasma Sources Science and Technology 29 (2), 025026, 2020 | 5 | 2020 |
| Effect of an electron beam on a dual-frequency capacitive rf plasma: experiment and simulation M Bogdanova, D Lopaev, A Zotovich, O Proshina, T Rakhimova, ... Plasma Sources Science and Technology 31 (9), 094001, 2022 | 4 | 2022 |
| Modification of Porous Ultralow-k Film by Vacuum Ultraviolet Emission AI Zotovich, SM Zyryanov, DV Lopaev, AA Rezvanov, AG Attallah, ... ACS Applied Electronic Materials 4 (6), 2760-2776, 2022 | 4 | 2022 |
Dmitry Lopaev (ORCID: 0000-0003-49...Moscow State University, Skobeltsyn Institute of Nuclear Physics, Microelectronics Dep.Verified email at dnph.phys.msu.su
