Подписаться
Andre Anders
Andre Anders
Leibniz Institute of Surface Engineering (IOM)
Подтвержден адрес электронной почты в домене iom-leipzig.de - Главная страница
Название
Процитировано
Процитировано
Год
A structure zone diagram including plasma-based deposition and ion etching
A Anders
Thin Solid Films 518 (15), 4087-4090, 2010
10642010
Cathodic Arcs: From Fractal Spots to Energetic Condensation
A Anders
Cathodic Arcs: From Fractal Spots to Energetic Condensation. New York …, 2008
10462008
Handbook of plasma immersion ion implantation and deposition
A Anders
Wiley, 2000
7562000
Dynamically modulating the surface plasmon resonance of doped semiconductor nanocrystals
G Garcia, R Buonsanti, EL Runnerstrom, RJ Mendelsberg, A Llordes, ...
Nano letters 11 (10), 4415-4420, 2011
6372011
Ion flux from vacuum arc cathode spots in the absence and presence of a magnetic field
A Anders, GY Yushkov
Journal of Applied Physics 91 (8), 4824-4832, 2002
4722002
Nanoindentation and nanoscratching of hard carbon coatings for magnetic disks
TY Tsui, GM Pharr, WC Oliver, CS Bhatia, RL White, S Anders, A Anders, ...
MRS Online Proceedings Library (OPL) 383, 447, 1995
4621995
High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering
A Anders, J Andersson, A Ehiasarian
Journal of applied physics 102 (11), 2007
4382007
Ion charge state distributions of vacuum arc plasmas: The origin of species
A Anders
Physical Review E 55 (1), 969, 1997
4341997
Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)
A Anders
Journal of Applied Physics 121 (17), 2017
3722017
Metal plasma immersion ion implantation and deposition: a review
A Anders
Surface and Coatings Technology 93 (2-3), 158-167, 1997
3551997
Hardness, elastic modulus, and structure of very hard carbon films produced by cathodic‐arc deposition with substrate pulse biasing
GM Pharr, DL Callahan, SD McAdams, TY Tsui, S Anders, A Anders, ...
Applied physics letters 68 (6), 779-781, 1996
3421996
Discharge physics of high power impulse magnetron sputtering
A Anders
Surface and Coatings Technology 205, S1-S9, 2011
3412011
Approaches to rid cathodic arc plasmas of macro-and nanoparticles: a review
A Anders
Surface and Coatings Technology 120, 319-330, 1999
3371999
A discussion on the absence of plasma in spark plasma sintering
DM Hulbert, A Anders, J Andersson, EJ Lavernia, AK Mukherjee
Scripta Materialia 60 (10), 835-838, 2009
3222009
Review of cathodic arc deposition technology at the start of the new millennium
DM Sanders, A Anders
Surface and Coatings Technology 133, 78-90, 2000
3152000
Ion velocities in vacuum arc plasmas
GY Yushkov, A Anders, EM Oks, IG Brown
Journal of Applied Physics 88 (10), 5618-5622, 2000
3122000
A review comparing cathodic arcs and high power impulse magnetron sputtering (HiPIMS)
A Anders
Surface and Coatings Technology 257, 308-325, 2014
2952014
The absence of plasma in “spark plasma sintering”
DM Hulbert, A Anders, DV Dudina, J Andersson, D Jiang, C Unuvar, ...
Journal of Applied Physics 104 (3), 2008
2772008
Plasma-based ion implantation and deposition: A review of physics, technology, and applications
J Pelletier, A Anders
IEEE Transactions on Plasma Science 33 (6), 1944-1959, 2005
2562005
Deposition rates of high power impulse magnetron sputtering: Physics and economics
A Anders
Journal of Vacuum Science & Technology A 28 (4), 783-790, 2010
2442010
В данный момент система не может выполнить эту операцию. Повторите попытку позднее.
Статьи 1–20