| Fully model-based methodology for simultaneous correction of extreme ultraviolet mask shadowing and proximity effects PCW Ng, 2 Kuen-Yu, 3 Yen-Min, 4 Fu-Min, AC Chen Journal of Micro/Nanolithography, MEMS and MOEMS 10 (1), 013004-013004-13, 2011 | 38 | 2011 |
| Servo system design of a high-resolution piezo-driven fine stage for step-and-repeat microlithography systems KY Tsai, JY Yen IECON'99. Conference Proceedings. 25th Annual Conference of the IEEE …, 1999 | 31 | 1999 |
| Modeling the defect inspection sensitivity of a confocal microscope EM Gullikson, E Tejnil, KY Tsai, AR Stivers, H Kusunose Emerging Lithographic Technologies IX 5751, 1223-1229, 2005 | 18 | 2005 |
| Method for improving accuracy of parasitics extraction considering sub-wavelength lithography effects KY Tsai, WJ Hsieh, BS Chang US Patent 8,438,505, 2013 | 17 | 2013 |
| Impacts of point spread function accuracy on patterning prediction and proximity effect correction in low-voltage electron-beam–direct-write lithography CH Liu, PCW Ng, YT Shen, SW Chien, KY Tsai Journal of Vacuum Science & Technology B, Nanotechnology and …, 2013 | 17 | 2013 |
| Architecture for next-generation massively parallel maskless lithography system (MPML2) MS Su, KY Tsai, YC Lu, YH Kuo, TH Pei, JY Yen Alternative Lithographic Technologies II 7637, 394-401, 2010 | 15 | 2010 |
| Design of automatic controllers for model-based OPC with optimal resist threshold determination for improving correction convergence YS Su, PCW Ng, KY Tsai, YY Chen Optical Microlithography XXI 6924, 1357-1365, 2008 | 15 | 2008 |
| Heavy metal incorporated helium ion active hybrid non-chemically amplified resists: Nano-patterning with low line edge roughness PG Reddy, N Thakur, CL Lee, SW Chien, CP Pradeep, S Ghosh, KY Tsai, ... AIP Advances 7 (8), 085314, 2017 | 14 | 2017 |
| A new method to improve accuracy of leakage current estimation for transistors with non-rectangular gates due to sub-wavelength lithography effects KY Tsai, MF You, YC Lu, PCW Ng 2008 IEEE/ACM International Conference on Computer-Aided Design, 286-291, 2008 | 14 | 2008 |
| DQIT:/spl mu/-synthesis without D-scale fitting KY Tsai, HA Hindi IEEE transactions on automatic control 49 (11), 2028-2032, 2004 | 14 | 2004 |
| Design of feedforward filters for improving tracking performances of existing feedback control systems KY Tsai, CD Schaper, T Kailath Proceedings of the 2002 American Control Conference (IEEE Cat. No. CH37301 …, 2002 | 14 | 2002 |
| New parametric point spread function calibration methodology for improving the accuracy of patterning prediction in electron-beam lithography CH Liu, HT Ng, KY Tsai Journal of Micro/Nanolithography, MEMS, and MOEMS 11 (1), 013009-013009, 2012 | 11 | 2012 |
| Manufacturability Analysis of a Micro-Electro-Mechanical Systems–Based Electron-Optical System Design for Direct-Write Lithography SY Chen, SC Chen, HH Chen, KY Tsai, HH Pan Japanese Journal of Applied Physics 49 (6S), 06GE05, 2010 | 11 | 2010 |
| Impacts of optical proximity correction settings on electrical performances MF You, PCW Ng, YS Su, KY Tsai, YC Lu Design for Manufacturability through Design-Process Integration 6521, 287-293, 2007 | 11 | 2007 |
| Model-based proximity effect correction for electron-beam direct-write lithography CH Liu, PL Tien, PCW Ng, YT Shen, KY Tsai Alternative Lithographic Technologies II 7637, 430-437, 2010 | 10 | 2010 |
| A novel curve-fitting procedure for determining proximity effect parameters in electron beam lithography CH Liu, HT Ng, PCW Ng, KY Tsai, SJ Lin, JH Chen Lithography Asia 2008 7140, 367-376, 2008 | 10 | 2008 |
| Method for design of multi-objective robust controllers KY Tsai, H Hindi US Patent App. 10/709,458, 2004 | 10 | 2004 |
| Method for calibrating a manufacturing process model KY Tsai, ACH Chen, JH Li US Patent 9,541,500, 2017 | 8 | 2017 |
| Silicon photodiodes for electron beam position and drift detection in scanning electron microscopy and electron beam lithography system YH Kuo, CJ Wu, JY Yen, SY Chen, KY Tsai, YY Chen Nuclear Instruments and Methods in Physics Research Section A: Accelerators …, 2011 | 8 | 2011 |
| On the sensitivity improvement and cross-correlation methodology for confocal EUV mask blank defect inspection tool fleet KY Tsai, E Gullikson, P Kearney, A Stivers 25th Annual BACUS Symposium on Photomask Technology 5992, 1178-1186, 2005 | 8 | 2005 |
Haitham HindiPrincipal Research Scientist, Amazon.com, USAVerified email at amazon.com
