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Bruno Lee Sang
Bruno Lee Sang
Postdoctoral researcher
Подтвержден адрес электронной почты в домене usherbrooke.ca
Название
Процитировано
Процитировано
Год
Technology platform for the fabrication of titanium nanostructures
S Ecoffey, M Guilmain, JF Morissette, F Bourque, J Pont, BL Sang, ...
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2011
112011
A fabrication process for emerging nanoelectronic devices based on oxide tunnel junctions
D Drouin, G Droulers, M Labalette, B Lee Sang, P Harvey-Collard, ...
Journal of nanomaterials 2017, 2017
72017
Selective dry etching of TiN nanostructures over SiO2 nanotrenches using a Cl2/Ar/N2 inductively coupled plasma
B Lee Sang, MJ Gour, M Darnon, S Ecoffey, A Jaouad, B Sadani, ...
Journal of Vacuum Science & Technology B, Nanotechnology and …, 2016
52016
Inductively coupled plasma etching of ultra-shallow Si3N4 nanostructures using SF6/C4F8 chemistry
BL Sang, MJ Gour, A Jaouad, S Ecoffey, M Darnon, B Sadani, A Souifi, ...
Microelectronic Engineering 141, 68-71, 2015
52015
Selective dry etching of titanium nitride nanostructures with chlorine-based inductively coupled plasma
BL Sang, MJ Gour, M Darnon, S Ecoffey, A Jaouad, B Sadani, A Souifi, ...
40th Micro and Nano Engineering Conference, 2014
32014
Tunable bandpass filter with serially coupled ring resonators assisted MZI
N Kohli, BL Sang, F Nabki, M Ménard
IEEE Photonics Journal 13 (4), 1-8, 2021
12021
A fabrication process for self-connected horizontal SiGe nanowires
M Merhej, S Ecoffey, B Sadani, B Lee–Sang, T Baron, S David, D Drouin, ...
Microelectronic Engineering 220, 111150, 2020
12020
Serially coupled ring resonator-MZI based optical bandpass filter with wide bandwidth tunability
N Kohli, BL Sang, F Nabki, M Ménard
Integrated Photonics Research, Silicon and Nanophotonics, IM3A. 3, 2020
2020
Nanofabrication et integration 3D: La procédé Nanodamascene
G Droulers, M Labalette, BL Sang, Y Ayadi, A Souifi, M Pioro-Ladriere, ...
Entretiens Jacques Cartier–Objets connectés, 2016
2016
CMOS BEOL compatible process for the fabrication of single electron transistors, using TiN/Al2O3/TiN junctions
SB Lee, S Ecoffey, S Monfray, D Drouin
42nd International Conference on Micro and Nano Engineering, MNE 2016, 2016
2016
CMOS BEOL compatible process for the fabrication of SET using TiN/Al2O3/TiN junctions
BL Sang, S Ecoffey, D Drouin
Micro/Nano Engineering, 2016
2016
Développement de procédés technologiques pour une intégration 3D monolithique de dispositifs nanoélectroniques sur CMOS
BLEE SANG, S CHARLEBOIS, A JAOUAD, A SOUIFI, S MONFRAY
2016
The nanodamascene process: A versatile fabrication technique for nanoelectronic applications
D Drouin, G Droulers, M Labalette, BL Sang, P Harvey-Collard, ...
2015 IEEE 15th International Conference on Nanotechnology (IEEE-NANO), 1262-1266, 2015
2015
Inductively coupled plasma etching of ultra-shallow Si3N4 and SiO2 nanostructures
BL Sang, A Jaouad, S Ecoffey, M Darnon, MJ Gour, B Sadani, A Souifi, ...
40th Micro and Nano Engineering Conference, 2014
2014
3D integration of double gate single electron transistors in the CMOS Back-End-Of-Line for ultra-low power gas sensing
Y Ayadi, BL Sang, B Sadani, K El Hajjam, S Ecoffey, F Calmon, A Souifi, ...
Integration of metallic single electron transistors on CMOS substrate
BL Sang, K El Hajjam, Y Ayadi, S Ecoffey, B Sadani, A Souifi, F Calmon, ...
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