| Low-k films modification under EUV and VUV radiation TV Rakhimova, AT Rakhimov, YA Mankelevich, DV Lopaev, AS Kovalev, ... Journal of Physics D: Applied Physics 47 (2), 025102, 2013 | 66 | 2013 |
| Interaction of F atoms with SiOCH ultra-low-k films: I. Fluorination and damage TV Rakhimova, DV Lopaev, YA Mankelevich, AT Rakhimov, SM Zyryanov, ... Journal of Physics D: Applied Physics 48 (17), 175203, 2015 | 47 | 2015 |
| Modification of organosilicate glasses low-k films under extreme and vacuum ultraviolet radiation TV Rakhimova, AT Rakhimov, YA Mankelevich, DV Lopaev, AS Kovalev, ... Applied Physics Letters 102 (11), 2013 | 42 | 2013 |
| Interaction of F atoms with SiOCH ultra low-k films. Part II: etching TV Rakhimova, DV Lopaev, YA Mankelevich, KA Kurchikov, SM Zyryanov, ... Journal of Physics D: Applied Physics 48 (17), 175204, 2015 | 28 | 2015 |
| Determination of the excited argon states densities in high-frequency capacitive discharge AS Kovalev, KA Kurchikov, OV Proshina, TV Rakhimova, AN Vasilieva, ... Physics of Plasmas 26 (12), 2019 | 10 | 2019 |
| Low-k protection from F radicals and VUV photons using a multilayer pore grafting approach A Zotovich, A Rezvanov, R Chanson, L Zhang, N Hacker, K Kurchikov, ... Journal of Physics D: Applied Physics 51 (32), 325202, 2018 | 9 | 2018 |
| Photoabsorption and damage of OSG low‐k films by VUV emission at 140–160 nm DV Lopaev, VV Rakhlinsky, SM Zyryanov, YA Mankelevich, ... Plasma Processes and Polymers 15 (3), 1700166, 2018 | 8 | 2018 |
| Measurements of the populations of metastable and resonance levels in the plasma of an RF capacitive discharge in argon AN Vasilieva, DG Voloshin, AS Kovalev, KA Kurchikov Plasma Physics Reports 41, 426-433, 2015 | 3 | 2015 |
| Low-k OSG damage and etching by F atoms at lowered temperatures S Zyryanov, K Kurchikov, D Lopaev, Y Mankelevich, A Palov, ... ISPC 22nd International Symposium on Plasma Chemistry, 2015 | 2 | 2015 |
| Effect of VUV photons on low-k OSG damage and etching by F atoms at the lowered temperature DV Lopaev, TV Rakhimova, YA Mankelevich, KA Kurchikov, SM Zyryanov, ... Plasma Etch and Strip in Microtechnology, 2015 | 1 | 2015 |
| Spectroscopic determination of excited atomic states populations in CCP AR discharge K Kurchikov, A Kovalev, A Vasilieva, O Braginsky APS Annual Gaseous Electronics Meeting Abstracts, HW1. 070, 2013 | 1 | 2013 |
| Interaction of F atoms with SiCOH ultra low-k films. Part I: Fluorination and damage T Rakhimova, D Lopaev, Y Mankelevich, A Rakhimov, S Zyryanov, ... | | 2015 |
| F atoms interaction with nanoporous OSG low-k materials T Rakhimova, A Rakhimov, S Zyryanov, D Lopaev, Y Mankelevich, ... | | 2014 |
| Modification of OSG based low-k films under EUV and VUV exposure T Rakhimova, A Rakhimov, Y Mankelevich, D Lopaev, A Kovalev, ... | | 2013 |
| 1-D model of OSG low-k films modification by EUV/VUV emission TV Rakhimova, AT Rakhimov, YA Mankelevich, DV Lopaev, SM Ziryanov, ... | | 2013 |
